MICRO-MATERIAL HANDLING EMPLOYING E-BEAM GENERATED TOPOGRAPHIES OF COPPER AND ALUMINIUM
DOI:
https://doi.org/10.7166/22-2-24Keywords:
copper, aluminium, micro-material handling system, Van der Waals forces, Electron beam (e-beam) evaporator, silicon substrate, Rumpf-Rabinovich?s rms formulaAbstract
ENGLISH ABSTRACT: This paper focuses on the employment of copper and aluminium in a micro-material handling system actuated by Van der Waals forces. Electron beam (e-beam) evaporator deposited both materials on a silicon substrate at a rate of 0.6-1.2 Angstroms/second, vacuum pressure between 2x10-6 and 3x10-6mbar, and at a current less than 10mA. A Veeco NanoMan V Atomic Force Microscope with Nanoscope version 7.3 software was used to analyse the root mean square (rms) surface roughnesses of the generated topographies. Rumpf-Rabinovich
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Published
2011-11-05
How to Cite
Matope, S., van der Merwe, A., Nemutudi, R., Nkosi, M., & Maaza, M. (2011). MICRO-MATERIAL HANDLING EMPLOYING E-BEAM GENERATED TOPOGRAPHIES OF COPPER AND ALUMINIUM. The South African Journal of Industrial Engineering, 22(2). https://doi.org/10.7166/22-2-24
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General Articles
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