MICRO-MATERIAL HANDLING EMPLOYING E-BEAM GENERATED TOPOGRAPHIES OF COPPER AND ALUMINIUM

S. Matope, A.F. van der Merwe, R. Nemutudi, M. Nkosi, M. Maaza

Abstract


ENGLISH ABSTRACT: This paper focuses on the employment of copper and aluminium in a micro-material handling system actuated by Van der Waals forces. Electron beam (e-beam) evaporator deposited both materials on a silicon substrate at a rate of 0.6-1.2 Angstroms/second, vacuum pressure between 2x10-6 and 3x10-6mbar, and at a current less than 10mA. A Veeco NanoMan V Atomic Force Microscope with Nanoscope version 7.3 software was used to analyse the root mean square (rms) surface roughnesses of the generated topographies. Rumpf-Rabinovichs rms formula was used to determine the Van der Waals forces exerted by the surfaces. It was synthesised that an e-beam deposition of 7 minutes duration on both materials produced an optimum micro-material handling solution, with copper suitable for the pick-up position and aluminium for the placement position.

AFRIKAANSE OPSOMMING: Die fokus van die artikel is op die gebruik van koper en aluminium in n mikromateriaalhanteringstelsel, aangedryf deur Van der Waalskragte. n Elektronstraal-verdamper plaas albei materiale op n silikonbasis teen n tempo van 0.6-1.2 Angstrom/sekonde, vakuumdruk tussen 2x10-6 en 3x10-6mbar, en teen n stroom van minder as 10mA. n Veeco NanoMan V Atomic Force mikroskoop, met Nanoscope 7.3 program-matuur is gebruik om die wortel-gemiddelde-kwadraat (wgk) oppervlak ruheid van die gegenereerde topografiete analiseer. Rumpf-Rabinovich se wgk-formule is gebruik om die Van der Waalskrage wat deur die oppervlaktes uitgeoefen word te bepaal. Dit is vasgestel dat n elektronstraalafsetting van 7 minute op albei materiale die optimale materiaalhanteringoplossing bied, met koper geskik vir die optelposisie en aluminium vir die plasingsposisie.


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DOI: https://doi.org/10.7166/22-2-24

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